Title:
METHOD FOR CLEANING SUBSTRATE
Document Type and Number:
Japanese Patent JP2984141
Kind Code:
B
Abstract:
PURPOSE: To clean a substrate at a low cost without having spotting on the surface by drying.
CONSTITUTION: The contaminant on the surface of a substrate 4 is cleaned off as follows. (1) The contaminated substrate is dipped in an org. solvent 2, and the contaminant is washed away by the solvent 2 from the substrate 4. (2) The solvent 2 is heated to a temp. 1.5-10°C lower than the b.p. to form a solvent vapor layer 3 on the solvent 2. (3) The substrate 4 in the solvent 2 is pulled up from the solvent 2 at the speed of 8.4 to 15.0mm/sec to volatilize the solvent on the substrate 4 into the solvent vapor layer 3.
Inventors:
Saito, Makoto
Application Number:
JP1992000104774
Publication Date:
September 24, 1999
Filing Date:
April 23, 1992
Export Citation:
Assignee:
KYOCERA CORP
International Classes:
C23G5/028; B08B3/08; C23G5/00; B08B3/08; (IPC1-7): C23G5/028
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