Title:
METHOD FOR CONTINUOUS PLASMA GRAFT TREATMENT
Document Type and Number:
Japanese Patent JP3292924
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a method for continuous plasma graft treatment for readily obtaining sufficient graft rate.
SOLUTION: This method for continuously plasma-grafting a material to be treated comprises a step for irradiating the material to be treated, arranged in the exterior of electrodes with a plasma generated between the electrodes for generating the plasma under an atmospheric pressure in a plasma-treating chamber in which the material to be treated is continuously moved, to form active species, and a following step for introducing the irradiated material to be treated into a graft-treating chamber in which the material to be treated can be continuously moved, and graft-polymerizing a polymerizable monomer on the active species in the treating chamber.
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Inventors:
Seiichi Kataoka
Susumu Yoshikawa
Zenichiro Maekawa
Noboru Saeki
Yoshihiro Masui
Tatsumi Tatsumi
Goto Nori
Susumu Yoshikawa
Zenichiro Maekawa
Noboru Saeki
Yoshihiro Masui
Tatsumi Tatsumi
Goto Nori
Application Number:
JP2000138389A
Publication Date:
June 17, 2002
Filing Date:
May 11, 2000
Export Citation:
Assignee:
National Institute of Advanced Industrial Science and Technology
Pearl Industry Co., Ltd.
Nisshin Fiber Co., Ltd.
Seiichi Kataoka
Pearl Industry Co., Ltd.
Nisshin Fiber Co., Ltd.
Seiichi Kataoka
International Classes:
D06M14/18; (IPC1-7): D06M14/18
Domestic Patent References:
| JP11256476A | ||||
| JP2000302902A | ||||
| JP2000309657A | ||||
| JP2001159074A |
Attorney, Agent or Firm:
Eiji Saegusa
Eiji Saegusa
Eiji Saegusa
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