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Title:
METHOD FOR CONTROLLING THICKNESS OF ELECTROLESS PLATING FILM
Document Type and Number:
Japanese Patent JPH0432573
Kind Code:
A
Abstract:

PURPOSE: To control the thickness of an electroless plating film at a relatively low cost and with sufficient precision by detecting the progress of plating from a change in the liq. surface with a partitioned section communicating with a residual section through a metallic mesh dipped in an electroless plating soln.

CONSTITUTION: A metallic mesh 3 laid over the bottom opening of a vessel 2 is dipped in an electroless plating soln. 1 to form a partitioned section A communicating with a residual section B only through the mesh 3. The plating soln. 1 in the residual section B is then introduced by a feed pump 4 into the vessel 2 from its upper opening, and the plating soln. 1 is circulated between the sections A and B through the mesh 3. As electroless plating proceeds, the liq. surface 21 of the section A is raised due to the clogging of the mesh 3. The clogging of the mesh 3 accurately corresponds to the thickness of a plating film on a body to be electroless-plated. Accordingly, the ascension of the liq. surface 21 is measured to detect the progress of plating, and the thickness of the plating film is controlled.


Inventors:
YOSHIZAWA IZURU
YAMAGUCHI NOBORU
Application Number:
JP13938290A
Publication Date:
February 04, 1992
Filing Date:
May 28, 1990
Export Citation:
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Assignee:
MATSUSHITA ELECTRIC WORKS LTD
International Classes:
G01B13/06; C23C18/31; H05K3/18; (IPC1-7): C23C18/31; G01B13/06; H05K3/18
Attorney, Agent or Firm:
Takehiko Matsumoto