Title:
METHOD FOR CORRECTING ILLUMINATION DEFECT ON PHOTOMASK
Document Type and Number:
Japanese Patent JP3075229
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To make it possible to improve the efficiency of correction work and to deposit a CVD film registered with high accuracy to the edge of a defective part by executing deposition processing by correcting the size of a slit illumination image at the time of the deposition processing of the CVD film, i.e., the size of a laser beam with respect to the size of the slit illumination image at the time of observation.
SOLUTION: The slit illumination image 1 formed by regulating the slit size and by slit illumination light for observation is so registered as to be aligned to the edge of the defective part 4 on a Cr film 2 (a). The size of the slit illumination image 1 is the desired size of the CVD film. The slit size is corrected by using a CVD spread correction factor and a magnification correction factor by the chromatic aberration of an irradiation optical system, by which the size of the slit illumination image 1 is corrected in such a manner that the CVD film of the desired size is obtd. (b). The CVD film is deposited by irradiation with the laser beam at the corrected slit size (c). Consequently, the pattern 6 of the desired laser CVD film exactly registered to the edge of the defective part 4 is formed.
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Inventors:
Yukio Morishige
Yousuke Kusumi
Atsushi Ueda
Yousuke Kusumi
Atsushi Ueda
Application Number:
JP26559697A
Publication Date:
August 14, 2000
Filing Date:
September 30, 1997
Export Citation:
Assignee:
NEC
International Classes:
C23C16/52; G03F1/72; H01L21/027; (IPC1-7): G03F1/08; C23C16/52; H01L21/027
Domestic Patent References:
| JP2204746A | ||||
| JP1195451A | ||||
| JP1118135A | ||||
| JP1106062A | ||||
| JP61228626A | ||||
| JP5265193A | ||||
| JP8106155A |
Attorney, Agent or Firm:
Naoki Kyomoto (2 outside)