To provide a method for curing a photocurable resin composition, capable of controlling stepwisely and stably a cured condition in a desired condition and easily taking process margin; and to provide a method for making a relief pattern.
In the method for curing the photocurable resin composition, a base generating agent for generating a polyamine through photoisomerization reaction and intramolecular cyclization reaction by heating and a photocurable resin composition containing a specific polymer precursor are used, and storage elasticity of the resin composition at predetermined temperature is stepwisely changed by the steps 1 to 4. The method for manufacturing the relief pattern is also disclosed. A step 1 is for coating the photocurable resin composition on a base material and forming a coated film, a step 2 is for irradiating the coated film with light from the base material side or the coated film surface side, a step 3 is for heating the coated film and curing at least a part of the coated film, and a step 4 is for repeating the steps 2 and 3 to cure the coated film.
FUKUDA TOSHIHARU
KAWAGUCHI KOJI
SAKAYORI KATSUYA
Akihiko Yamashita