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Title:
METHOD FOR CUTTING NANOSHEET ALONG CRYSTALLOGRAPHIC AXIS ORIENTATION, AND CUT NANOSHEET
Document Type and Number:
Japanese Patent JP2023117549
Kind Code:
A
Abstract:
To provide a method for cutting a nanosheet along the crystallographic axis orientation, and a nanosheet obtained thereby.SOLUTION: A method for cutting a nanosheet along the crystallographic axis orientation includes preparing a nanosheet dispersion liquid having nanosheets dispersed in an organic solvent, preparing a substrate having an uneven structure, and forming, on the substrate, a nanosheet monolayer film composed of nanosheets, using the nanosheet dispersion liquid. The nanosheet and the substrate satisfy a predetermined relationship.SELECTED DRAWING: Figure 1

Inventors:
SAKAI NOBUYUKI
SASAKI TAKAYOSHI
Application Number:
JP2022020168A
Publication Date:
August 24, 2023
Filing Date:
February 14, 2022
Export Citation:
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Assignee:
NAT INST MATERIALS SCIENCE
International Classes:
C01G23/04; B82Y30/00; B82Y40/00; C01G33/00



 
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