Title:
METHOD OF DEPOSITING DIAMOND-LIKE CARBON FILM
Document Type and Number:
Japanese Patent JP2015224348
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a method of depositing a diamond-like carbon film that can be manufactured by a relatively simple method and has excellent adhesion to a metal substrate.SOLUTION: A method of depositing a diamond-like carbon film includes the steps of: installing a metal substrate inside a vacuum chamber and decompressing the vacuum chamber 10 to a vacuum; passing 2-20A current through a tungsten filament 3 provided in the vacuum chamber under an argon gas atmosphere after being decompressed, and applying an AC voltage having a maximum value of 350 V-1,600 V to the metal substrate on a rotation sample stage 8 to bombard a metal substrate surface with argon ions; depositing a base layer on the metal substrate, bombarded with argon ions, by the PVD method; and depositing a diamond-like carbon film on the base layer by the PVD method or CVD method.
Inventors:
ITO HIROTAKA
Application Number:
JP2014107762A
Publication Date:
December 14, 2015
Filing Date:
May 26, 2014
Export Citation:
Assignee:
KOBE STEEL LTD
International Classes:
C23C14/02; C23C14/06; C23C16/27
Domestic Patent References:
| JP2010209446A | 2010-09-24 | |||
| JP2012509402A | 2012-04-19 | |||
| JP2006028563A | 2006-02-02 |
Attorney, Agent or Firm:
Isono International Patent and Trademark Office