To provide a method for depositing a semi-conductor thin film of uniform film thickness and excellent crystallinity on an insulating substrate.

The method for depositing the semi-conductor thin film on the insulating substrate comprises steps of: bonding a transfer substrate 10 having a semi-conductor substrate 12 and a transfer layer 15 which is located on a surface of the semi-conductor substrate 12 and includes a semi-conductor thin film layer 18 on the opposite side to the surface of the semi-conductor substrate 12 to an insulating substrate 22 on the semi-conductor thin film layer 18 side, and removing the semi-conductor substrate 12 side of the transfer substrate 10 bonded to the insulating substrate 22 to the semi-conductor thin film layer 18.