Title:
METHOD FOR DESIGNING PHOTOMASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
Document Type and Number:
Japanese Patent JP2014149458
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a photomask excellent in manufacturing stability of a semiconductor device.SOLUTION: A method for designing a photomask includes the steps of: reading out layout data for a mask pattern; extracting at least two hole patterns HP1 which are arrayed in a first direction and are separated from each other so as to have a space of a reference value or less, out of the layout data; and moving at least one of the at least two hole patterns HP1 in a second direction perpendicular to the first direction, and thereby arranging the at least two hole patterns HP1 so that the hole patterns are alternately positioned in the second direction.
Inventors:
MATSUURA SEIJI
Application Number:
JP2013018918A
Publication Date:
August 21, 2014
Filing Date:
February 01, 2013
Export Citation:
Assignee:
RENESAS ELECTRONICS CORP
International Classes:
G03F1/70; G06F17/50; H01L21/027; H01L21/82
Domestic Patent References:
| JPH07202143A | 1995-08-04 | |||
| JP2007311410A | 2007-11-29 | |||
| JP2005268748A | 2005-09-29 | |||
| JP2005317580A | 2005-11-10 | |||
| JP2009169153A | 2009-07-30 |
Attorney, Agent or Firm:
Shinji Hayami
Amagi 聡
Amagi 聡