To accurately recognize an exposure position mark to correctly and efficiently detect a displacement amount of the exposure position based on the measurement result.

An exposure position mark is made up of a primary pattern composed of an inner square pattern 10a and an outer square pattern 10b, and a rectangular frame shaped secondary pattern in which an inner circumference and an outer circumference are formed into square patterns 20a and 20b. Further, the centroid positions of the primary and the secondary pattern are conformed to each other. The secondary pattern is formed so that it may be arranged into the region between the inner square pattern 10a and the outer square pattern 10b of the primary pattern. A value measured by detecting displacement of a centroid position from the inner square pattern 10a of the primary pattern and the square pattern 20a in the inner circumference of the secondary pattern, and a value measured by detecting displacement of a centroid position from the outer square pattern 10b of the primary pattern and the outer-circumferential square pattern 20b of the secondary pattern, are averaged out to find an exposure position displacement.