METHOD FOR DETECTING POSITION OF MATERIAL BY ION BEAM

Japanese Patent JPS6197828

A

PURPOSE:To contrive the improvement in S/N ratio of detection signals and to enable the highly accurate positioning by scanning the material to be subjected to the position detection with ion beams while repeating ON and OFF with a constant frequency and taking out only the frequency component out of the detection signals of the secondary electrons or Auger electrons generated from the above material. CONSTITUTION:The position of the secondary electrons or Auger electrons generated at irradiating the detection mark for positioning which is arranged on a material 9 with a focused ion beam is detected by detectors 12-16. Namely the generated electrons are detected by the detector 12 and the scanning with ion beams is effected by supplying the signals of scanning period to a deflecting electrode 8 from a controller 13. A blanking electrode 3 is controlled by the controller 13 so that the ion beam is turned on or off with a constant frequency which is higher than the scanning period. The detection signal obtained from the material 9 by the detector 12 is led to a phase discrimination detector 14 through a phase shifter 15 and is detected by phase discrimination according to the frequency sent to the blanking electrode 3 from the ion beam controller 13 thereby detecting the position.

NAKAMURA KAZUO
MORI KATSUMI
ASATA SUSUMU
MATSUI SHINJI

JP21903684A

May 16, 1986

October 18, 1984

Click for automatic bibliography generation  

NEC CORP

G03F1/00; G03F1/38; H01L21/027; H01L21/18; H01L21/30; (IPC1-7): G03F1/00; H01L21/18

Uchihara Shin

Previous Patent: A sensor controlling device, a sensor controlling method, and a sensor control program

Next Patent: DISPLAY DEVICE