METHOD FOR DETERMINING CLEANLINESS OF CLEANING MEMBER, METHOD FOR DETERMINING ADSORPTION CHARACTERISTICS OF CONTAMINANT CONTAMINATING CLEANING MEMBER, METHOD FOR DETERMINING CLEANLINESS OF SUBSTRATE, PROGRAM FOR DETERMINING CLEANLINESS OF SUBSTRATE, AND PROGRAM FOR DETERMINING END POINT OF CLEANING PROCESS

Japanese Patent JP2021184463

A

To provide a contamination degree evaluation method of a new cleaning member that can be applied to improved break-in processing and improved pre-shipment inspection of a cleaning member.SOLUTION: A method for determining the cleanliness of a cleaning member that is in contact with a substrate and performs scrub cleaning measures oscillation frequency of a crystal oscillator before attaching a contaminant on an electrode and records it to a record medium as initial value S50, performs self-cleaning of the cleaning member by discharging contaminant from the cleaning member into cleaning liquid S51, brings drainage after the self-cleaning into contact with the electrode of the crystal oscillator, measures oscillation frequency response of the crystal oscillator where the contaminant is attached onto the electrode after attaching the contaminant contained in the drainage onto the electrode of the crystal oscillator, determines the cleanliness of the cleaning member S52 on the basis of the measured oscillation frequency response, and removes the contaminant from upon the electrode of the crystal oscillator S53.SELECTED DRAWING: Figure 14

TAKATO CHIKAKO
UNO MEGUMI
ABE YUJI
KON TOSHIYA
NAKAMURA YUMIKO
SHIMA SHOHEI

JP2021083726A

December 02, 2021

May 18, 2021

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EBARA CORP

H01L21/304; B08B3/04; G01N5/02; G01N29/036

Seiji Ohno
Kobayashi Hideyoshi
Hiroyuki Ohno
Koji Morita
Osamu Tsuda
Matsuno Chihiro
Seiichi Sakitani
Hiroshi Nomoto

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