Title:
METHOD FOR DETERMINING COMPLIMENTARY DIVISION CONDITION, COMPLIMENTARY DIVISION METHOD AND PROGRAM
Document Type and Number:
Japanese Patent JP3903947
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a method for determining a complimentary division condition, a program and a complimentary division method by which an appropriate complimentary division condition is proposed to suppress a change in pattern or the breakage of a mask.
SOLUTION: The internal stress of a mask is determined based on the changing quantity of surrounding marks when an opening is formed in the mask, and the obtained value is used for a first analysis (step ST12). In the first analysis, the changing quantity of a pattern and a stress concentration generated by the opening of a division pattern are analyzed based on a first analysis model (step ST13). In a second analysis, a changing quantity due to the external force of a film between the division patterns is analyzed (step ST14). The sequence of the first and second analyses may be changeable. Thus, the first analysis result with respect to an influence of the opening of the pattern and the second analysis result with respect to the strength of a membrane between the patterns are combined, and the complimentary division condition is determined based on an allowable changing quantity and stress concentration (step ST15).
Inventors:
Ashi Ashida
Koichi Nakayama
Koichi Nakayama
Application Number:
JP2003112045A
Publication Date:
April 11, 2007
Filing Date:
April 16, 2003
Export Citation:
Assignee:
ソニー株式会社
International Classes:
H01L21/027; G03C5/00; G03F1/20; G03F1/22; G03F7/20; G06T1/00; (IPC1-7): H01L21/027; G03F1/16; G03F7/20
Domestic Patent References:
| JP2001274072A |
Foreign References:
| WO2002021582A1 |
Attorney, Agent or Firm:
Takahisa Sato
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