Title:
エッチング処理装置における耐プラズマ性高分子材料からなる膜の厚さの決定方法
Document Type and Number:
Japanese Patent JP5095058
Kind Code:
B2
Inventors:
Furuse Muneo
Tomoyuki Tamura
Mitsue Suehiro
Tomoyuki Tamura
Mitsue Suehiro
Application Number:
JP2001261974A
Publication Date:
December 12, 2012
Filing Date:
August 30, 2001
Export Citation:
Assignee:
株式会社日立製作所
International Classes:
H01L21/3065; H05H1/46; B01J3/00; B01J19/08; C23C16/505; C23F4/00; H01L21/302
Domestic Patent References:
| JP2001057361A | ||||
| JP7147247A | ||||
| JP2000353695A | ||||
| JP11354500A | ||||
| JP7099183A |
Foreign References:
| WO2000000999A1 |
Attorney, Agent or Firm:
Patent Business Corporation Daiichi International Patent Office