Title:
METHOD AND DEVICE FOR ANALYZING OBJECT TO BE EXAMINED BY REFLECTED LIGHT MEASUREMENT
Document Type and Number:
Japanese Patent JP2002323446
Kind Code:
A
Abstract:
To accurately analyze an object to be examined by an inexpensive configuration in a method and a device for analyzing the object to be examined by reflected light measurement.
Irradiation light L1 is applied to the spot region of a chip 1 for measurement where the object to be examined is spotted in an irradiation region that is nearly overlapped to the spot region, and the object to be examined is analyzed via the state of reflected light L2 from the chip 1 for measurement of the irradiation light L1 that is irradiated in the irradiation region that is nearly overlapped to the spot region.
Inventors:
KUMAGAI TAKASHI
KAWAI KUNJI
OOHIRAOCHI YOSHIHIRO
KAWAI KUNJI
OOHIRAOCHI YOSHIHIRO
Application Number:
JP2001129948A
Publication Date:
November 08, 2002
Filing Date:
April 26, 2001
Export Citation:
Assignee:
MITSUBISHI CHEM CORP
International Classes:
G01N21/27; (IPC1-7): G01N21/27
Attorney, Agent or Firm:
Yu Sanada
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