Title:
METHOD AND DEVICE FOR APPLYING ELECTRON BEAM
Document Type and Number:
Japanese Patent JP3883361
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a method and a device for applying an electron beam that makes it possible to avoid the concentration of heat due to the electron beam by providing an irradiation window.
SOLUTION: In an electron beam irradiator where a triangular-wave current is fed to a scanning coil by using a power source for generating triangular waves to scan the electron beam in the first direction and a square-wave current is fed to a deflection coil by using a power source for generating square waves to scan the electron beam in the second direction orthogonal to the first one, the turning point of the orbit of the electron beam is apportioned to the second scanning direction by staggering time intervals to synchronize the leading edge of the square-wave current with respect to the peak value of the triangular-wave current.
Inventors:
Atsushi Nakamura
Masahiro Kiga
Masahiro Kiga
Application Number:
JP2000138845A
Publication Date:
February 21, 2007
Filing Date:
May 11, 2000
Export Citation:
Assignee:
Ebara Corporation
International Classes:
G21K5/04; B01D53/60; B01D53/74; (IPC1-7): G21K5/04; B01D53/60; B01D53/74
Domestic Patent References:
| JP384546U | ||||
| JP7320680A |
Attorney, Agent or Firm:
Isamu Watanabe
Shintaro Hotta
Shintaro Hotta
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