To provide a device for cleaning a substrate in which the quality of an electronic device is stabilized while reducing the running cost by suppressing variation in resistance of wiring.
The device for cleaning a substrate comprises: a chamber 2 equipped with a section 4 for turning a substrate 8 while holding, and an ejection nozzle 3 for ejecting cleaning liquid, or the like, to the substrate 8; a supply tank 23 for containing the cleaning liquid; piping 35 for supplying the cleaning liquid from the supply tank 23 to the ejection nozzle 3 and the pump 20 of a pressure feed mechanism; piping 37 for returning the cleaning liquid used for cleaning the substrate 8 in the chamber 2 back to the supply tank 23; and an ammonia supply source 19 for supplying ammonia to the supply tank 23, wherein ammonia is supplied from the ammonia supply source 19 to the supply tank 23 every time the substrate 8 is cleaned in the chamber 2.
COPYRIGHT: (C)2007,JPO&INPIT
DEGUCHI YASUYUKI
IKENOUCHI KATSUYUKI
MIYOSHI YUICHI
