Title:
METHOD AND DEVICE FOR CONTROL OF EXPOSURE
Document Type and Number:
Japanese Patent JP2809118
Kind Code:
B2
Abstract:
PURPOSE: To make it possible to control the pulse energy for each pulse at an arbitrary value by a method wherein, in accordance with the remaining energy obtained by subtracting the optical pulse energy which has been outputted so far from the total energy of exposure required for the exposure process, and the energy of optical pulse energy to be outputted next is prescribed.
CONSTITUTION: The pulse energy exposed to a wafer 6 is detected by the energy monitor 7 provided on the edge of a reticle 4. A feedback control operation, with which the output of a light source 2 is changed based on the pulse energy amount measured by an energy monitor, is conducted using a CPU 1. To be more precise, when the first application of the pulse is conducted, the pulse energy is controlled in such a manner that its value becomes the value obtained by having the desired total energy in one exposure divided by the total pulse number. In the second and the following light irradiation operations, the pulse energy is controlled successively in such a manner that its value become the value obtained by having the difference between the desired total exposure energy and the integrated value of exposure energy up to the present divided by the remaining pulse number.
Inventors:
KAJIKI YOSHIHIRO
Application Number:
JP25385494A
Publication Date:
October 08, 1998
Filing Date:
October 19, 1994
Export Citation:
Assignee:
NIPPON DENKI KK
International Classes:
G03F7/20; H01L21/027; H01S3/225; (IPC1-7): H01L21/027; G03F7/20
Domestic Patent References:
| JP562876A |
Attorney, Agent or Firm:
Naoki Kyomoto (2 outside)
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