Title:
METHOD AND DEVICE FOR CORRECTION OF SHIFTER RESIDUE DEFECT ON PHASE SHIFT MASK
Document Type and Number:
Japanese Patent JP3399408
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To make easily correctable shifter residue defects on a phase shift mask in a short time by using a UV pulse laser light to remove the shifter residue defects on a phase shift mask.
SOLUTION: A ultrashort pulse UV laser light 11 is reflected by a dichroic mirror 8 and converged through an objective lens 9 to irradiate a shifter residue defect 13 on a phase shift mask 14. The shifter residue defect 13 nonlinearly absorbs the ultrashort pulse UV laser light 11 and vaporizes to be removed by the laser ablation effect. A phase difference detecting part 10 is also disposed in order to maintain high correction accuracy, and the image showing changes in the phase in the processed part is monitored by the phase difference detecting part 10. Moreover, the completion of the process is detected by counting the interference fringes or by other methods to control the ultrashort pulse UV laser light 11. As for the ultrashort pulse UV laser light 11, laser light at 200 to 360 nm wavelength and having 10 psec to 50 fsec pulse width is selected.
Inventors:
Tsutomu Haneda
Application Number:
JP17305099A
Publication Date:
April 21, 2003
Filing Date:
June 18, 1999
Export Citation:
Assignee:
NEC
International Classes:
H01L21/027; G01J9/02; G01N21/956; G03F1/26; G03F1/68; G03F1/72; G03F1/84; (IPC1-7): G03F1/08; G01J9/02; G01N21/956; H01L21/027
Domestic Patent References:
| JP862827A | ||||
| JP4289861A | ||||
| JP6114640A | ||||
| JP9281691A | ||||
| JP5249657A | ||||
| JP8194302A | ||||
| JP6201602A |
Attorney, Agent or Firm:
Masahiko Desk (1 person outside)