To provide a method and a device for drying a substrate, which can shorten time necessary for drying treatment of the substrate, and which can eliminate the restriction of a substance to be dried.

Electromagnetic wave radiated from a halogen heater 40 provided above is irradiated on a radiation plate 50 for heating, far infrared rays radiated from the radiation plate 50 are irradiated on the upper surface side of the substrate 1 for heating, and simultaneously, far infrared rays reflected by a reflecting plate 60 provided below are irradiated on the lower surface side of the substrate 1 for heating so as to dry the substrate 1. The device includes a conveyance means 5 for horizontally conveying the substrate 1, the halogen heater 40, the radiation plate 50 provided between the halogen heater 40 and the conveyance means 5, and the reflecting plate 60 provided below. The radiation plate 50 receives the electromagnetic wave radiated from the halogen heater 40 and radiates the far infrared rays.