Title:
METHOD AND DEVICE FOR FORMING PATTERN
Document Type and Number:
Japanese Patent JP2012166302
Kind Code:
A
Abstract:
To provide a pattern forming method and device that can simply form a pattern by using a block copolymer.
The pattern forming method includes: forming a film of a block copolymer, including at least two kinds of polymers, on a substrate; heating the block copolymer film; irradiating the heated block copolymer film with UV light; and supplying a developing solution to the UV light-irradiated block copolymer film.
Inventors:
MURAMATSU MAKOTO
KIYONO YURIKO
KIYONO YURIKO
Application Number:
JP2011029138A
Publication Date:
September 06, 2012
Filing Date:
February 14, 2011
Export Citation:
Assignee:
TOKYO ELECTRON LTD
TOSHIBA CORP
TOSHIBA CORP
International Classes:
B82B3/00; B82Y40/00; H01L21/027; H01L21/3065
Domestic Patent References:
| JP2012061531A | 2012-03-29 | |||
| JP2011228713A | 2011-11-10 | |||
| JP2012061531A | 2012-03-29 |
Other References:
JPN6013010326; Ｋ．Ｗ．Ｇｕａｒｉｎｉ ｅｔ．ａｌ．: '"Ｏｐｔｉｍｉｚａｔｉｏｎ ｏｆ Ｄｉｂｌｏｃｋ Ｃｏｐｏｌｙｍｅｒ Ｔｈｉｎ Ｆｉｌｍ Ｓｅｌｆ Ａｓｓｅｍｂｌｙ"' Ａｄｖａｎｃｅｄ Ｍａｔｅｒｉａｌｓ Ｖｏｌ．１４， Ｎｏ．１８, 20020916, ｐｐ．１２９０-１２９４
JPN6013010328; Ｊｏｙ Ｙ． Ｃｈｅｎｇ ｅｔ．ａｌ．: '"Ｓｉｍｐｌｅ ａｎｄ Ｖｅｒｓａｔｉｌｅ Ｍｅｔｈｏｄｓ Ｔｏ Ｉｎｔｅｇｒａｔｅ Ｄｉｒｅｃｔｅｄ Ｓｅｌｆ-Ａｓｓｅｍｂｌｙ ｗｉｔｈ Ｏｐｔｉｃａｌ Ｌｉｔｈｏｇｒａｐｈｙ Ｕｓｉｎｇ ａ Ｐ' ＡＣＳ Ｎａｎｏ Ｖｏｌ．４， Ｎｏ．８, 20100715, ｐｐ．４８１５-４８２３
JPN6013010328; Ｊｏｙ Ｙ． Ｃｈｅｎｇ ｅｔ．ａｌ．: '"Ｓｉｍｐｌｅ ａｎｄ Ｖｅｒｓａｔｉｌｅ Ｍｅｔｈｏｄｓ Ｔｏ Ｉｎｔｅｇｒａｔｅ Ｄｉｒｅｃｔｅｄ Ｓｅｌｆ-Ａｓｓｅｍｂｌｙ ｗｉｔｈ Ｏｐｔｉｃａｌ Ｌｉｔｈｏｇｒａｐｈｙ Ｕｓｉｎｇ ａ Ｐ' ＡＣＳ Ｎａｎｏ Ｖｏｌ．４， Ｎｏ．８, 20100715, ｐｐ．４８１５-４８２３
Attorney, Agent or Firm:
Tadahiko Ito