Title:
METHOD AND DEVICE FOR FORMING THIN FILM
Document Type and Number:
Japanese Patent JP2009214195
Kind Code:
A
Abstract:
To provide a method for forming a thin film, by which a crystal thin film is formed with high accuracy.
The method for forming a thin film includes steps of: coupling a top end of a probe 15 that physically interacts with atoms constituting a crystal body SP to a coupling point on the surface of the crystal body SP; and tearing a single layer or a plurality of layers of the crystal body SP to form a crystal thin film by moving the probe 15 coupled to the surface of the crystal body SP to allow the coupling point to follow the probe 15.
Inventors:
KAWAI TAKASUMI
MIYAMOTO YOSHIYUKI
MIYAMOTO YOSHIYUKI
Application Number:
JP2008057670A
Publication Date:
September 24, 2009
Filing Date:
March 07, 2008
Export Citation:
Assignee:
NEC CORP
International Classes:
B82B3/00; B82Y30/00; B82Y40/00; C01B31/04; G01Q80/00
Attorney, Agent or Firm:
Shinji Hayami