PURPOSE: To continuously and stably form an excellent thin film on a substrate for a long time by partially melting a target with a heating means and irradiating the target with a thin film forming laser beam.
CONSTITUTION: A vacuum pump 9 and a gas feed part 8 are actuated to adjust the pressure and atmosphere in a vacuum vessel 1, and a target 5 is heated by a heating means 6 and melted. Under such conditions, a thin film forming laser beam from a laser oscillator 7 is condensed on the molten target 5 through an inlet window 1a, then the target is irradiated the laser beam. Accordingly, a thin film forming atom is spattered from the target and deposited on the opposed target 3 held at a specified temp. to form a thin film. As a result, a fusifomr structre is not formed on the target 5 surface, the surface condition of the target 5 is kept constant, and an excellent thin film is continuously formed for a long time.
OHATA KAZUMI
FUJINO SHUICHI
MORISHITA TADATAKA
ULVAC KOOPOREETO CENTER KK
HITACHI CABLE
MITSUBISHI MATERIALS CORP
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