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Title:
METHOD AND DEVICE FOR MANUFACTURING ELECTRET
Document Type and Number:
Japanese Patent JP2010267884
Kind Code:
A
Abstract:

To provide a method and a device for manufacturing an electret that can shorten a time needed to manufacture the electret.

The device 100 for manufacturing the electret includes: an upper chamber 101 into which a helium gas is injected; a lower chamber 102 in which an argon gas is added to air; a pedestal 104 for holding a silicon microphone 110; electrodes 105 and 106 provided to the pedestal 104; a DC power source 107 for applying a DC voltage between the electrodes 105 and 106; and an ionizing radiation generating device 108 for generating an ionizing radiation. The device 100 is configured to generate positive ions and negative ions by the ionizing radiation to electrostatically charge a silicon oxide film 132 provided to a back plate 130 to the negative polarity with the negative ions in a state wherein the DC voltage is applied to counter electrodes of the silicon microphone 110 in an atmosphere wherein the argon gas is added to the air.


Inventors:
Hagiwara, Hiroshi
Goto, Masahide
Tajima, Toshifumi
Kidokoro, Kenichi
Yasuno, Isanaga
Kodama, Hidekazu
Iguchi, Yoshinori
Application Number:
JP2009000119217
Publication Date:
November 25, 2010
Filing Date:
May 15, 2009
Export Citation:
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Assignee:
NIPPON HOSO KYOKAI
RION CO LTD
KOBAYASHI RIGAKU KENKYUSHO
NHK ENGINEERING SERVICES INC
International Classes:
H01G7/02; H04R19/04; H04R31/00
Domestic Patent References:
JPH036500A
JP2005183437A
JPH11117172A
JPH08190992A
JP2008112755A
JPH036500A
JP2005183437A
Attorney, Agent or Firm:
有我 軍一郎