Title:
METHOD AND DEVICE OF MANUFACTURING MULTI-ELECTRON SOURCE AND METHOD OF MANUFACTURING IMAGE DISPLAY DEVICE
Document Type and Number:
Japanese Patent JP2010232144
Kind Code:
A
Abstract:
To easily perform a process for detecting and restoring a low-resistance element, both accurately and simply in a multi-electron source equipped with an electron-emitting element.
A process for applying a voltage for detection; measuring a leakage current of an element; calculating the resistance value of the element based on the leak current value; and attempting to increase the resistance of an element the resistance value of which is equal to or less than a specified value, by applying a voltage for restoration to the element is performed sequentially for each element.
COPYRIGHT: (C)2011,JPO&INPIT
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Inventors:
KUNO MITSUTOSHI
Application Number:
JP2009081306A
Publication Date:
October 14, 2010
Filing Date:
March 30, 2009
Export Citation:
Assignee:
CANON ANELVA CORP
International Classes:
H01J9/50; H01J9/02; H01J9/42
Attorney, Agent or Firm:
Keisuke Watanabe
Yoshihiro Yamaguchi
Yoshihiro Yamaguchi
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