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Title:
METHOD AND DEVICE FOR MEASURING ABERRATION, METHOD AND DEVICE FOR EXPOSURE AND METHOD OF ADJUSTING PROJECTION OPTICAL SYSTEM
Document Type and Number:
Japanese Patent JP2006279028
Kind Code:
A
Abstract:

To provide a method and device capable of measuring an aberration of a projection optical system in a short time.

An imaging characteristic of a projection optical system PL is corrected by controlling the positions along the optical axis and tilt angles with respect to two axes, of predetermined lens elements 131, 132 in the projection optical system PL. To revert the imaging characteristic of the projection optical system PL to an initial state, a plurality of predetermined aberrations of the projection optical system PL is measured and the lens elements 131, 132 are driven to correct the aberrations thereof. On this occasion, in order to decrease the number of measurement points of aberrations on an image plane of the projection optical system PL, measurements are preferentially made on an aberration having a lower coordinate order in the image plane for aberrations of the same order.


Inventors:
MATSUYAMA TOMOYUKI
HAGIWARA TSUNEYUKI
Application Number:
JP2006051776A
Publication Date:
October 12, 2006
Filing Date:
February 28, 2006
Export Citation:
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Assignee:
NIKON CORP
International Classes:
H01L21/027; G01M11/02; G03F7/20
Attorney, Agent or Firm:
Satoshi Omori