Title:
METHOD AND DEVICE FOR MONITORING ABNORMALITY
Document Type and Number:
Japanese Patent JPH04186119
Kind Code:
A
Abstract:
PURPOSE:To prevent an erroneous alarm by providing a means for judging whether an abnormality is caused by a substantial abnormality of a plant or by the drift by a process signal single body from the deviation between a monitor target process value and its standard value. CONSTITUTION:In an abnormality monitor device 1, process state amounts such as pressure, flow rate and temperature are read through a process input device 2 and supplied to an arithmetic processing device 3. In the device 3, the process state amounts are subjected to processing such as industrial value conversion in an input signal processing part 8, the correlation between the monitor target process signal processed in the processing part 8 and a signal correlated therewith is operated in an abnormality diagnostic processing part 9 to determine a normal value, and the abnormality of the process is judged. When the process is abnormal, it is judged by a failure judgment processing part 10 whether this abnormality is caused by a substantial abnormality of the plant or by the drift by the process signal body, and the judgment result is outputted to a display device 5 and a printing device 6 through an output control device 4.
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Inventors:
FUJISHIMA YASUTAKA
Application Number:
JP31383590A
Publication Date:
July 02, 1992
Filing Date:
November 21, 1990
Export Citation:
Assignee:
HITACHI LTD
International Classes:
G01D21/00; (IPC1-7): G01D21/00
Attorney, Agent or Firm:
Katsuo Ogawa (2 outside)