Title:
METHOD AND DEVICE FOR PATTERN CORRECTION
Document Type and Number:
Japanese Patent JP3479838
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To prevent a film formation from fine particles produced in a laser CVD as a CVD nucleus and the film edge from swelling outside the laser irradiation pattern in a conventional correction method of fine clear defect.
SOLUTION: A holding means holds a processed surface of a substrate downward, a film is formed by spraying a gas supplied from a gas supplying means through a gas introduction means on the laser irradiation point with radiating the laser beam on the processed surface downward from the substrate, and corrects the clear defect of the pattern film on the substrate.
Inventors:
Yukio Morishige
Makoto Omiya
Makoto Omiya
Application Number:
JP2000320107A
Publication Date:
December 15, 2003
Filing Date:
October 19, 2000
Export Citation:
Assignee:
NEC
International Classes:
C23C16/04; C23C16/44; C23C16/48; G03F1/72; G03F7/40; G02F1/13; H01L21/027; (IPC1-7): G03F1/08; C23C16/44; G02F1/13; G03F7/40; H01L21/027
Domestic Patent References:
| JP6336249A | ||||
| JP61279690A | ||||
| JP862827A |
Attorney, Agent or Firm:
Rock wall Fuyuki