METHOD AND DEVICE FOR PRODUCTION OF MICRO STRUCTURE

Japanese Patent JP3804293

B2

PROBLEM TO BE SOLVED: To provide a method and device for producing a micro structure having a high yield and a high image resolution in the laminating direction. SOLUTION: While rotating a substrate holder 30 and a transfer table 40, the joining face of plural thin films 12a on a substrate 10 and the transfer table 40 is irradiated with an argon high speed atom beam 5, plural thin films 12a are peeled from the substrate 10, plural thin films 12a are laminated/joined on the transfer table 40, a micro structure is formed.