Title:
METHOD AND DEVICE FOR PURIFYING GAS
Document Type and Number:
Japanese Patent JP3446985
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a method and a device for purifying gas by which coexisting gaseous contaminant is simultaneously removed in removal of particulates in which photoelectron emission material is used.
SOLUTION: In the method for purifying gas, photoelectrons 15 are discharged by irradiating ultraviolet rays 5-1 and/or radioactive rays to the photoelectron emission material 5-2 in an electric field. Particulates 17 contained in space are charged by these photoelectrons and collected 6. In this case, electrode material 4 for setting the electric field contains a photocatalyst and gaseous contaminant contained in gas is simultaneously removed. The above-mentioned electrode material is obtained by adding TiO2, ZnO, etc., being semiconductor material of the photocatalyst onto the base material.
Inventors:
Toshiaki Fujii
Kazuhiko Sakamoto
Kazuhiko Sakamoto
Application Number:
JP23129096A
Publication Date:
September 16, 2003
Filing Date:
August 14, 1996
Export Citation:
Assignee:
Ebara Corporation
International Classes:
B01J35/02; B03C3/02; B03C3/38; B03C3/43; B03C3/60; B01D53/86; (IPC1-7): B03C3/43; B01D53/86; B01J35/02; B03C3/02; B03C3/38; B03C3/60
Domestic Patent References:
| JP1266864A | ||||
| JP5317749A | ||||
| JP3288559A | ||||
| JP871447A | ||||
| JP6252242A | ||||
| JP6198215A | ||||
| JP596125A | ||||
| JP6205930A |
Attorney, Agent or Firm:
Dai Matsuda