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Title:
METHOD AND DEVICE FOR SEPARATING SLURRIED POLISHING LIQUID FOR SEMICONDUCTOR
Document Type and Number:
Japanese Patent JPH1128338
Kind Code:
A
Abstract:

To prevent slurried flocculate from being included into a recovered polishing agent.

This separation device comprises a first filter 1 with an ultrafiltration membrane 1m and a second filter 2 with a precision filtration memberane 2m which are connected to each other in that order. First, fine particle contained in a polishing liquid L is discharged to the first filtrate Fp side and a first concentrated Po is supplied to the second filter 2 by separating a used polishing liquid L into the first Fp and the first concentrated liquid Po with the filtrate ultrafiltration membrane 1m. Next, a coarse particle contained in the first concentrate Fc is discharged to a second concentrate Sc side and a second filtrate Sp is supplied to a recovery side by separating the first concentrate Fc into the second concentrate Sc and the second filtrate Sp with a precision filtration element 2m.


Inventors:
TACHIKI ETSUJI
Application Number:
JP18609997A
Publication Date:
February 02, 1999
Filing Date:
July 11, 1997
Export Citation:
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Assignee:
MATSUSHITA SEIKO ENG KK
International Classes:
B01D61/14; H01L21/304; (IPC1-7): B01D61/14; H01L21/304
Domestic Patent References:
JPS476702A
JP60164065B
Attorney, Agent or Firm:
Juichi Kitaya (1 person outside)



 
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