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Title:
METHOD AND DEVICE FOR TREATING WASTE LIQUID
Document Type and Number:
Japanese Patent JP2007237064
Kind Code:
A
Abstract:

To provide a method and a device for treating a waste liquid capable of efficiently treating a waste liquid while suppressing the generation of nitric acid, particularly, paying attention to characteristics of the waste liquid per se that is to be a treated liquid, in order to solve the problem that there is a fear of device corrosion as nitric acid is concurrently produced by the reaction of nitrogen compounds, although a high temperature of about 630°C is required to decompose a hardly degradable hazardous substance when the waste liquid containing the hardly degradable hazardous substance and the nitrogen compounds are supercritically water-oxidated.

The method and device for treating a waste liquid including the step of supercritically water-oxidating the waste liquid containing the hardly degradable substance and nitrogen compounds and with calorific value of a certain value or more or/and with mole ratio TOC/TN of total organic carbon (TOC) and total nitrogen (TN) of a certain value or more at a temperature required to decompose a hardly degradable hazardous substance, and the step of adding a nitric acid production suppressant consisting of KOH and NaOH to the waste liquid before heating the waste liquid to the temperature required to decompose a hardly degradable hazardous substance.

COPYRIGHT: (C)2007,JPO&INPIT


Inventors:
OHASHI TOMOTSUGU
SUZUGAKI HIROSHI
Application Number:
JP2006062226A
Publication Date:
September 20, 2007
Filing Date:
March 08, 2006
Export Citation:
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Assignee:
ORGANO KK
International Classes:
B01J3/00; C02F1/74
Domestic Patent References:
JP2005152804A2005-06-16
JP2003245628A2003-09-02
JP2003236570A2003-08-26
JPH11226583A1999-08-24
JP2002186842A2002-07-02
JP2002177975A2002-06-25
JPH03500264A1991-01-24
Attorney, Agent or Firm:
Toshimitsu Ban