METHOD FOR DISPERSING SEMICONDUCTOR ULTRAMICROPARTICLE AND METHOD FOR PRODUCING SEMICONDUCTOR ULTRAMICROPARTICLE DISPERSION

Japanese Patent JP2005105155

A

To provide a method for uniformly dispersing high-luminous-efficiency semiconductor ultramicroparticles in a solvent containing water without detriment to their properties and to provide a method for producing a semiconductor ultramicroparticle dispersion by dispersing high-luminous-efficiency semiconductor ultramicroparticles in a solvent containing water without detriment to their properties.

The method for dispersing the semiconductor ultramicroparticles is a method for dispersing the semiconductor ultramicroparticles in an aqueous solution containing the semiconductor ultramicroparticles and comprises alkalifying a mixed solution containing a solvent containing water, semiconductor ultramicroparticles, and a 3C or lower thioalchol by adjusting its pH with a pH modifier.

ISHIZUKA MASAYUKI
NAKANO TOYOMASA
SAITO MITSUMASA

JP2003341108A

April 21, 2005

September 30, 2003

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SUMITOMO OSAKA CEMENT CO LTD

B01J13/00; C09K11/02; C09K11/08; C09K11/54; C09K11/56; C09K11/88; (IPC1-7): C09K11/02; B01J13/00; C09K11/08; C09K11/54; C09K11/56; C09K11/88

Masatake Shiga
Tadashi Takahashi
Takashi Watanabe
Masakazu Aoyama
Suzuki Mitsuyoshi
Kazuya Nishi
Yasuhiko Murayama

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