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Title:
METHOD OF DIVIDING SUBSTRATE AND METHOD OF MANUFACTURING INDICATOR
Document Type and Number:
Japanese Patent JP2009195944
Kind Code:
A
Abstract:

To provide a method of dividing a substrate by which the damage to the function part of the end face of the substrate is avoided and also two substrates arranged opposingly are simultaneously divided by the external force of one time.

Reforming regions 5 are formed by emitting the laser beam individually to the respective two substrates 1, 2 from the opposing and the opposite side and also the reforming regions 5 are formed by condensing the laser beams by aberration compensation in the vicinity of the end face of the opposing side of an TFT substrate 1 on which the function part 6 consisting of a polyimide film is formed and a crack having high rectilinear propagation property is generated on the end face of the opposing side of the TFT substrate 1 on which the function part 6 is formed by internal stress caused by the swelling of the reforming region. The reforming regions 5 are formed by condensing the laser beams by aberration compensation in the vicinity of the opposing side and the end face on the opposite side of an opposing substrate 2 which is opposed to the TFT substrate 1 on which the functional part 6 is formed and a crack having high rectilinear propagation property is also generated on the end face of the opposite side by the internal stress caused by the swelling of the reforming region.


Inventors:
YAMAZAKI YUTAKA
Application Number:
JP2008039759A
Publication Date:
September 03, 2009
Filing Date:
February 21, 2008
Export Citation:
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Assignee:
SEIKO EPSON CORP
International Classes:
B23K26/38; B28D5/00; C03B33/09; G02F1/1333; B23K101/40
Attorney, Agent or Firm:
Masahiko Ueyanagi
Osamu Suzawa
Kazuhiko Miyasaka