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Title:
METHOD FOR DRIVING CHEMICAL LIQUID SUPPLY DEVICE
Document Type and Number:
Japanese Patent JP3619616
Kind Code:
B2
Abstract:

PROBLEM TO BE SOLVED: To enable a process in which a prescribed quantity of chemical liquid is discharged accurately from a chemical liquid discharge part by a method in which residual pressure in a pump chamber is removed after the end of a discharge process, a suction side valve is closed, the chemical liquid in the chemical liquid discharge part is returned with a discharge side valve opened, and the chemical liquid in the discharge part is sucked into the pump chamber.
SOLUTION: To apply chemical liquid L to a semiconductor wafer W, a discharge side valve 35 is opened to open a discharge side channel 32, a driving part 50 is driven to a discharge side, a diaphragm 28 is deformed, and the chemical liquid L is led to a nozzle 6 through a discharge hose 30b and discharged. Next, when the driving part 50 is stopped, the valve 35 is opened, a suction side valve 34 is opened, and residual pressure in a pump chamber 27 is removed. Next, after the valve 34 being opened, the valve 35 is opened, the diaphragm 28 is moved back, and the chemical liquid L in a nozzle 6 is sucked to prevent the liquid from sagging. After that, the valve 34 is opened, the diaphragm 28 is moved back, and the chemical liquid L is sucked.


Inventors:
Takeshi Yajima
Application Number:
JP21347396A
Publication Date:
February 09, 2005
Filing Date:
August 13, 1996
Export Citation:
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Assignee:
Koganei Co., Ltd.
International Classes:
F04B53/10; B01J4/02; B05B9/043; H01L21/027; H01L21/304; (IPC1-7): B05B9/043; B01J4/02; F04B53/10; H01L21/027
Domestic Patent References:
JP5251329A
JP8083759A
Attorney, Agent or Firm:
Yamato Tsutsui
Yoshitaka Kozuka
Toshiro Ohata
Ning Takano