To remove moisture attached to a surface of a substrate substantially completely by irradiation of ultraviolet light without heating the substrate.

After removing a liquid film and liquid droplets of a cleaning liquid from the surface of the substrate 1 in a first drying station 11, the substrate 1 is carried into a drying chamber 24 in a second drying station 12 by means of a transfer conveyor 2. In the drying chamber 24, a lamp house 40 equipped with dielectric barrier discharge lamps 31 is housed, and the inside of the drying chamber 24 is in an inactive gas atmosphere. Due to this structure, moisture such as absorbed water in the surface of the substrate 1 is decomposed and removed by the ultraviolet light irradiated from the discharge lamps 31.