Title:
METHOD AND EQUIPMENT FOR PATTERN LITHOGRAPHY
Document Type and Number:
Japanese Patent JPH0513312
Kind Code:
A
Abstract:
PURPOSE: To provide pattern lithography technology which makes it possible to perform pattern lithography wherein fairly large-scale pattern data is repeatedly used, instructions on a lithography work and process management easily at low cost.
CONSTITUTION: A pattern lithography equipment by which a pattern is written on a wafer 5 with electron beam 2 is provided with an IC card reader/writer 16 on which an IC card 15 housing job data or pattern data or both of them is installed. The job data and the pattern data are used for controlling a pattern lithography work.
Inventors:
MIZUNO FUMIO
Application Number:
JP16270391A
Publication Date:
January 22, 1993
Filing Date:
July 03, 1991
Export Citation:
Assignee:
HITACHI LTD
International Classes:
H01L21/027; (IPC1-7): H01L21/027
Attorney, Agent or Firm:
Yamato Tsutsui
Next Patent: JPH0513313