Title:
超純水を製造する方法及び装置
Document Type and Number:
Japanese Patent JP2009512227
Kind Code:
A
Abstract:
The present invention relates to a system and method for producing ultrapure water, particular for use in immersion lithography processes. In one embodiment of the present invention, a self contained point-of-use cabinet that can consistently provide ultrapure water for use in immersion lithography equipment is provided. The present invention also relates to a system and method for providing a material having a predetermined specific refractive index to an immersion lithography device.
Inventors:
Wenden Niger
Application Number:
JP2008536680A
Publication Date:
March 19, 2009
Filing Date:
October 10, 2006
Export Citation:
Assignee:
Air Liquid Electronics US LP
International Classes:
H01L21/027; B01D19/00; B01D61/04; B01D61/16; B01D61/58; C02F1/20; C02F1/32; C02F1/42; C02F1/44; C02F1/50; C02F9/00
Attorney, Agent or Firm:
Takehiko Suzue
Satoshi Kono
Makoto Nakamura
Kurata Masatoshi
Takashi Mine
Yoshihiro Fukuhara
Toshio Shirane
Sadao Muramatsu
Nobuhisa Nogawa
Kocho Chojiro
Katsu Sunagawa
Tetsuya Kazama
Katsumura Hiro
Satoshi Kono
Makoto Nakamura
Kurata Masatoshi
Takashi Mine
Yoshihiro Fukuhara
Toshio Shirane
Sadao Muramatsu
Nobuhisa Nogawa
Kocho Chojiro
Katsu Sunagawa
Tetsuya Kazama
Katsumura Hiro