To provide an evaluating method capable of analytically evaluating unevenness of illuminance caused by a plane profile error of an optical surface on the basis of measurement data about the plane profile of the optical surface.
The evaluating method comprises a measuring step (S1) which measures the plane profile of the optical surface; an approximating step (S2) which approximates the plane profile of the optical surface by using a differentiable function on the basis of a measurement result of the measuring step; a differentiating step (S3) which carries out two differentiations for the differentiable function obtained in the approximating step and derives an illuminance unevenness function; and an evaluating step (S4) which analytically evaluates the unevenness of the illuminance caused by the plane profile error of the optical surface on the basis of the illuminance unevenness function obtained in the differentiating step.
KUDO YUJI
MAEDA NOBUO
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