Title:
METHOD FOR EXECUTING SEAL NI AND BRIGHT NI PLATING IN THE SAME PLATING CELL
Document Type and Number:
Japanese Patent JPH05230699
Kind Code:
A
Abstract:
PURPOSE:To decrease the man-hours for the management of equipment and plating conditions, to lessen the manpower for the management of the potential difference between sealing plating and bright plating and to reduce the floor space for the equipment by executing the sealing Ni plating and the bright Ni plating only with the bright sealing cell. CONSTITUTION:The current densities of the first half and second half within the set time are operated to generate two layers varying in the potential in the bright sealing cell 3. The potential falls and the conventional bright Ni plating takes place if the first half is set at the high current density. The potential rises and the conventional sealing Ni plating takes place if the second half is set at the low current density. The sealing Ni plating and the bright Ni plating are produced with one layer of the bright sealing cell 3 by setting the high condition current density at the time of initial setting.
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Inventors:
KONISHI KAZUHIKO
Application Number:
JP8511592A
Publication Date:
September 07, 1993
Filing Date:
February 21, 1992
Export Citation:
Assignee:
TOYO RIKO KK
International Classes:
C25D5/14; C25D15/02; C25D17/00; C25D19/00; C25D21/12; (IPC1-7): C25D5/14; C25D15/02; C25D17/00; C25D19/00; C25D21/12