PURPOSE: To improve the form of a pattern and resolution by a simple method of forming the ultraviolet-transmitting part of a mask with a material capable of shielding lights of (h) line and (i) line.
CONSTITUTION: The photosensitive polyimide is exposed to the ultraviolet rays emitted from an extra-high pressure mercury lamp mainly comprising (g) line (436 nm), (h) line (405 nm), and (i) line (365 nm) through the ultraviolet- transmitting part of the mask made of a material transmitting the ultraviolet rays of (g) line but shielding (h) line and (i) line and the specified other part of the mask for perfectly shielding all the ultraviolet rays, thus permitting the use of an expensive (g) line stepper and the like to be made unnecessary, so the exposing method itself to be reduced in cost, and the polyimide pattern good in form to be easily obtained.
ASANO MASAYA
EGUCHI MASUICHI
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