To provide a method of exposure and an aligner in which arbitrary high-resolution patterns are produced by a double exposure which is obtained with a fine line pattern exposure and a rough pattern exposure.

The process comprises an exposure step, in which periodic patterns are exposed on a photoreceptive substrate and a rough exposure step in which rough patterns of a resolution lower than that of the relevant pattern are exposed on the photoreceptive substrate, and latent images generated by this process at the same positions of the photoreceptive substrate are overlapped. The fine line exposure step and the rough exposure step need not be in the same sequence as in the figure, i.e., the rough exposure step may be done first, and in the case of multiple exposures, the steps may be done alternately.