Title:
METHOD FOR FABRICATING CRYSTALLINE SEMICONDUCTOR FILM AND APPARATUS FOR MANUFACTURING THE SAME
Document Type and Number:
Japanese Patent JP2004179322
Kind Code:
A
Abstract:
To satisfy the need of reducing the content of the unused catalytic metal element after crystallization remaining in a crystallized semiconductor film fabricated by using a catalytic metal element.
A laser beam is applied to a crystalline semiconductor film crystallized by a heat treatment in the presence of a catalytic metal element, and this results in the segregation of the catalytic metal element on the surface of the crystalline semiconductor film. The surface of the crystalline semiconductor film whereon the catalytic metal element is segregated is removed by etching, and this reduces the total content of the catalytic metal element in the film for lowering the catalytic metal element concentration level in the film.
Inventors:
MATSUO TAKUYA
ONUMA HIDETO
ONUMA HIDETO
Application Number:
JP2002342762A
Publication Date:
June 24, 2004
Filing Date:
November 26, 2002
Export Citation:
Assignee:
SHARP KK
SEMICONDUCTOR ENERGY LAB
SEMICONDUCTOR ENERGY LAB
International Classes:
G02F1/1368; H01L21/20; H01L21/322; H01L21/336; H01L27/08; H01L29/786; (IPC1-7): H01L21/20; H01L21/322; H01L21/336; H01L27/08; H01L29/786
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