Title:
METHOD FOR FABRICATING ELECTRON BEAM DEVICE AND SPACER AND ELECTRON BEAM DEVICE
Document Type and Number:
Japanese Patent JP3466981
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To suitably form a film on a spacer housed inside an air-tight container in an electron beam device.
SOLUTION: A method for fabricating an electron beam device having an air-tight container including therein an electron emitting element 1012 and a spacer 1020 housed inside the air-tight container, comprises an applying step of forming a film on a spacer substrate serving as the spacer 1020, wherein the applying step includes a step of discharging a liquid film material from a discharging portion in a predetermined direction so as to apply the material to part of the surface facing the discharging portion of the space substrate.
Inventors:
Yasuhiro Ito
Application Number:
JP2000037454A
Publication Date:
November 17, 2003
Filing Date:
February 16, 2000
Export Citation:
Assignee:
Canon Inc
International Classes:
H01J5/03; H01J29/87; H01J31/12; H01J9/24; (IPC1-7): H01J9/24; H01J5/03; H01J29/87; H01J31/12
Domestic Patent References:
| JP2000164129A | ||||
| JP1173897A | ||||
| JP8508846A |
Other References:
【文献】欧州特許出願公開405262(EP,A1)
Attorney, Agent or Firm:
Keisuke Watanabe
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