Title:
成膜方法
Document Type and Number:
Japanese Patent JP4803578
Kind Code:
B2
Abstract:
A film forming method, for depositing a thin film on a surface of a substrate mounted on a mounting table disposed in a vacuum processing chamber, includes an adsorption process for adsorbing a film forming material on the substrate by introducing a source gas into the processing chamber; and a reaction process for carrying out a film forming reaction, after the adsorption process, by introducing an energy transfer gas into the processing chamber and supplying thermal energy to the film forming material adsorbed on the substrate. By repeating the above process, the thin film is formed on the substrate in a layer-by-layer manner.
Inventors:
Isao Gunji
Yumiko Kono
Yumiko Kono
Application Number:
JP2005355152A
Publication Date:
October 26, 2011
Filing Date:
December 08, 2005
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
C23C16/44; C23C16/18; C23C16/34; H01L21/285
Domestic Patent References:
| JP2005302822A | ||||
| JP2003209103A | ||||
| JP2005086185A | ||||
| JP2005101101A | ||||
| JP2007504357A | ||||
| JP1290221A | ||||
| JP2004228601A |
Attorney, Agent or Firm:
Hiroshi Takayama