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Title:
METHOD FOR FINDING MOVEMENT AFTER ELASTIC REFLECTION OF PARTICLE ON ARBITRARY REFLECTING SURFACE IN ANISOTROPIC SPACE
Document Type and Number:
Japanese Patent JP2002076323
Kind Code:
A
Abstract:

To provide a method for obtaining the movement of particles after elastic reflection on an arbitrary reflecting surface in an anisotropic space where the movement state of electrons or holes after elastic reflection on the arbitrary reflecting surface in crystal can be calculated.

The movement state of the particles after elastic reflection is found by substituting elastic reflection occurring when power in an infinite size on the reflecting surface facing an arbitrary direction instantaneously operates in terms of time for movement, on which the force of the finite size operates in the anisotropic space where the movement energy of the particles depends on the direction of the movement quantity of the particles. Since impulse FΔ cannot directly be calculated in the case of reflection in a barrier B, the steep barrier B is substituted for a gentle barrier B' (showing a virtual reflecting surface whose inclination is constant). Since force F which the particles receive from the gentle barrier B' becomes finite, the movement of the particles on routes s and s' can be obtained by integrating hΔk/2π=FΔt.


Inventors:
EZAKI TATSUYA
Application Number:
JP2000256795A
Publication Date:
March 15, 2002
Filing Date:
August 28, 2000
Export Citation:
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Assignee:
NEC CORP
International Classes:
G06F19/00; H01L29/00; (IPC1-7): H01L29/00; G06F19/00
Attorney, Agent or Firm:
Yosuke Goto (1 person outside)