METHOD FOR FORMING ANALYZING TEMPERATURE-INCREASE PROFILE OF HEATING VAPORIZATION DEVICE USED FOR INDUCTION COUPLING PLASMA MASS SPECTROGRAPH

Title:

METHOD FOR FORMING ANALYZING TEMPERATURE-INCREASE PROFILE OF HEATING VAPORIZATION DEVICE USED FOR INDUCTION COUPLING PLASMA MASS SPECTROGRAPH

Document Type and Number:

Japanese Patent JPH05215720

Kind Code:

A

Abstract:

PURPOSE: To find a temperature-increase profile for analysis which can detect a specific element with the highest sensitivity by using one type of simulation temperature-increase profile.

CONSTITUTION: An ashing stage and a vaporization stage are indexed from a vaporization starting temperature which is shown by a mass spectrum which is obtained by heating a target to be analyzed according to a simulation temperature-increase profile A where first to fifth five stages A1-A5 are provided at an equal spacing and from the temperature of the maximum sensitivity, respectively.

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Inventors:

TAKASUKA MASAMI
MUKAI TOSHIO

Application Number:

JP4804792A

Publication Date:

August 24, 1993

Filing Date:

February 03, 1992

Export Citation:

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Assignee:

SHARP KK

International Classes:

G01N27/62; (IPC1-7): G01N27/62

Attorney, Agent or Firm:

Koji Onishi

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