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Title:
被処理物への被膜形成方法及びその装置
Document Type and Number:
Japanese Patent JP4278200
Kind Code:
B2
Abstract:
A method for forming a film on a strip material (m1) involves immersing material (m1) in a solution bath containing a film-forming component, taking material (m1) out of the solution bath and draining the solution adhering on material (m1) taken out of the solution bath. A method for forming a film on a strip material (m1) involves immersing material (m1) in a solution bath containing a film-forming component, taking material (m1) out of the solution bath and draining the solution adhering on material (m1) taken out of the solution bath. The time from taking material (m1) out of the solution bath to completion of draining is not less than 4 (preferably 4 - 12, especially 4 - 8) times the immersion time in the solution bath. The ambient temperature of atmosphere surrounding material (m1) from taking material (m1) out of the solution bath to completion of draining is lower than that of material (m1).

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Inventors:
Atsushi Ichikawa
Application Number:
JP11719298A
Publication Date:
June 10, 2009
Filing Date:
April 27, 1998
Export Citation:
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Assignee:
Bridgestone Corporation
International Classes:
B21C9/00; C23C20/08; B05C3/12; B05D1/18; B05D7/14; C10M103/06; C10M173/00; C10M173/02; B05D3/04
Domestic Patent References:
JP3207519A
JP49093946U
Attorney, Agent or Firm:
Ichiro Honda