To provide a method for forming a lens having a good design shape so as to attain high efficiency in condensing light, as for a method for forming a fine condensing lens on an image sensor part such as a CCD and a CMOS.
As for the method for forming the fine condensing lens on the light receiving part of the image sensor such as the CCD and the CMOS, a resist film is applied on a planarized layer formed on the light receiving part of the image sensor, and the resist film is exposed and developed via a photomask so as to attain the patterning of a lens shape, and the photomask is a transmissive type photomask with no light shielding layer, and the photomask is provided with a light-transmissive part, wherein the phase of transmitted light in each position is controlled at a prescribed width unit so as to obtain a desired light intensity distribution on the surface of a part to be exposed, and constituted of a light refractive medium having step parts on the surface part.
TOYAMA NOBUTO
MATSUI HIROYUKI
JPH04225278A | 1992-08-14 | |||
JPH1059746A | 1998-03-03 | |||
JP2000089014A | 2000-03-31 | |||
JPH07106237A | 1995-04-21 |
WO2000076002A1 | 2000-12-14 |