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Title:
METHOD FOR FORMING FINE-PARTICLE FILM
Document Type and Number:
Japanese Patent JP2009046741
Kind Code:
A
Abstract:

To provide a method for forming a fine-particle film, which can form the film or a layer formed of nano-sized fine particles of an oxide with high accuracy.

The method for forming the fine-particle film includes: using a coaxial vacuum arc vapor-deposition source 13 having a cylindrical anode electrode 21, a cathode electrode 22 which is placed in the anode electrode 21 and has a vapor deposition material 22A, and a trigger electrode 23 which is placed in the anode electrode 21 so as to be separated from the cathode electrode 22; and vapor-depositing fine particles of the vapor deposition material 22A on the surface of an adherend 15 in an atmosphere in which a reactive gas (oxygen) is introduced in a vacuum tank 10. The nano-sized fine particles formed in the vacuum arc vapor-deposition source 13 react with oxygen to form the oxide. The oxide is vapor-deposited onto the adherend 15, and thereby, the film of the nano-sized fine-particles of the oxide can be formed with high accuracy.


Inventors:
AGAWA YOSHIAKI
YAMAGUCHI KOICHI
TSUKAHARA NAOKI
MURAKAMI HIROHIKO
Application Number:
JP2007215795A
Publication Date:
March 05, 2009
Filing Date:
August 22, 2007
Export Citation:
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Assignee:
ULVAC CORP
International Classes:
C23C14/08
Domestic Patent References:
JP2007204810A2007-08-16
JPH05132755A1993-05-28
JP2006249558A2006-09-21
JP2003282557A2003-10-03
JP2000008159A2000-01-11
JP2005105314A2005-04-21
JP2004225107A2004-08-12
Attorney, Agent or Firm:
Junichi Omori
Ori Akira
Yasuo Iisaka